Future Trends In Microelectronics: Nano Millennium, The
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Description:
Nanotechnology has been named by the US government as one of the most important areas of forthcoming technology. This book presents contributions from a number of leading professionals in the semiconductor microelectronics industry debating the future evolution of their profession. As the end of CMOS scaling is approaching, what kind of research does the silicon industry need ...
Nanotechnology has been named by the US government as one of the most important areas of forthcoming technology. This book presents contributions from a number of leading professionals in the semiconductor microelectronics industry debating the future evolution of their profession. As the end of CMOS scaling is approaching, what kind of research does the silicon industry need ...
Description:
Nanotechnology has been named by the US government as one of the most important areas of forthcoming technology. This book presents contributions from a number of leading professionals in the semiconductor microelectronics industry debating the future evolution of their profession. As the end of CMOS scaling is approaching, what kind of research does the silicon industry need to continue its expansion? What is the future beyond shrinking silicon devices? Is there practicality in the fashionable topics like quantum computing, molecular computing, spintronics, and similar research trends? What is the most likely future of microelectronics in the near and long term?
Review:
'...well-organized and readable and includes sections by knowledgeable specialists in their fields. It will spur you to think and will help you realize how and why the technologies you are using may differ greatly in five or 10 years.' (EDN.com) '...lively and thought-provoking book...' (Choice, Vol. 40, No. 6 February 2003)
Table of Contents:
Preface (S. Luryi, et al.).PART I: THE FUTURE WITH SILICON.Microelectronics Technology: Challenges in the 21st Century (S. Sze).Trends in Microlithography (J. Benschop).Strategies at the End of CMOS Scaling (P. Solomon).Driving Technology to Re-Engineer Telecommunications (T. Smith, et al.).Rare Earth Metal Oxides as High-k Gate Insulators for Future MOSFETs (H. Iwai, et al.).Ultra-Thin Single- and Double-Gate MOSFETs for Future ULSI Applications: Measurements, Simulations, and Open Issues (D. Esseni, et al.).Future Silicon-on-Insulator MOSFETs: Chopped or Genetically Modified? (F. Allibert, et al.).Current Transport Models for Engineering Applications (T. Grasser & S. Selberherr).Advanced Physically Based Device Modeling for Gate Current and Hot-Carrier Phenomena in Scaled MOSFETs (P. Palestri, et al.).PART II: THE FUTURE BEYOND SILICON: SEMICONDUCTORS, SUPERCONDUCTORS, PHASE TRANSITIONS, DNA.FLUX-1: Designing the First Generation of 20-GHz Superconductor RSFQ Microprocessors in 1.75-mum Technology (M. Dorojevets).Silicon...Beyond Silicon: Beginning of the End or End of the Beginning? (I. Lagnado & P. de la Houssaye).Taming Tunneling (M. Kelly).Switching Device Based on a First-Order Metal-Insulator Transition Induced by an External Electric Field (F. Chudnovskiy & S. Luryi).DNA Conduction Mechanisms and Engineering (R. Zia, et al.).New Cold Cathode Paradigms for Vacuum Microelectronics Applications (M. Cahay, et al.).PART III: THE FUTURE ALONGSIDE SILICON: OPTICAL.The Evolution of Optical Data Storage (H. van Houten).Long Wavelength Quantum Dot Lasers: From Promising to Unbeatable (N. Ledentsov).Temperature-Insensitive Semiconductor Lasers (L. Asryan & S. Luryi).Trends in Semiconductor Laser Design: Balance Between Leakage, Gain and Loss in InGaAsP/InP Multiquantum Well Structures (G. Belenky, et al.).Terahertz Emitters Based on Intersubband Transitions (Q. Hu, et al.).The Future of Photovoltaics (M. Green).Infrared Detectors Based on InAs/GaSb Superlattices (M. Razeghi, et al.).Solid State Lighting (A. Zukauskas, et al.).Reduction of Reflection Losses in Nonlinear Optical Crystals by Motheye Patterning (A. Zaslavsky, et al.).Growth of III-Nitrides on Si(111) and GaN Templates: Challenges and Prospects (M. Sanchez-Garcia, et al.).PART IV: THE FUTURE WAY BEYOND SILICON: OTHER PARADIGMS.Quantum Computing: A View from the Enemy Camp (M. Dyakonov).Entanglement and Quantum Gate Operations with Spin-Qubits in Quantum Dots (J. Schliemann & D. Loss).Quantum Computation with Quasiparticles of the Fractional Quantum Hall Effect (D. Averin & V. Goldman).Photonics with Chips (A. Nurmikko).Metacrystals: Three Dimensional Systems of Interacting Quantum Dots (D. Johnstone).InGaAs/GaAs Quantum Well Microcavities with Spatially Controlled Carrier Injection (S. Mestanza, et al.).List of Contributors.Index.
Author Biography:
SERGE LURYI is Leading Professor and Chairman of the Department of Electrical and Computer Engineering at State University of New York at Stony Brook. JIMMY XU is Professor of Engineering and Professor of Physics at Brown University in Providence, Rhode Island. ALEX ZASLAVSKY is Associate Professor of Engineering and Physics at Brown University in Providence, Rhode Island.
Nanotechnology has been named by the US government as one of the most important areas of forthcoming technology. This book presents contributions from a number of leading professionals in the semiconductor microelectronics industry debating the future evolution of their profession. As the end of CMOS scaling is approaching, what kind of research does the silicon industry need to continue its expansion? What is the future beyond shrinking silicon devices? Is there practicality in the fashionable topics like quantum computing, molecular computing, spintronics, and similar research trends? What is the most likely future of microelectronics in the near and long term?
Review:
'...well-organized and readable and includes sections by knowledgeable specialists in their fields. It will spur you to think and will help you realize how and why the technologies you are using may differ greatly in five or 10 years.' (EDN.com) '...lively and thought-provoking book...' (Choice, Vol. 40, No. 6 February 2003)
Table of Contents:
Preface (S. Luryi, et al.).PART I: THE FUTURE WITH SILICON.Microelectronics Technology: Challenges in the 21st Century (S. Sze).Trends in Microlithography (J. Benschop).Strategies at the End of CMOS Scaling (P. Solomon).Driving Technology to Re-Engineer Telecommunications (T. Smith, et al.).Rare Earth Metal Oxides as High-k Gate Insulators for Future MOSFETs (H. Iwai, et al.).Ultra-Thin Single- and Double-Gate MOSFETs for Future ULSI Applications: Measurements, Simulations, and Open Issues (D. Esseni, et al.).Future Silicon-on-Insulator MOSFETs: Chopped or Genetically Modified? (F. Allibert, et al.).Current Transport Models for Engineering Applications (T. Grasser & S. Selberherr).Advanced Physically Based Device Modeling for Gate Current and Hot-Carrier Phenomena in Scaled MOSFETs (P. Palestri, et al.).PART II: THE FUTURE BEYOND SILICON: SEMICONDUCTORS, SUPERCONDUCTORS, PHASE TRANSITIONS, DNA.FLUX-1: Designing the First Generation of 20-GHz Superconductor RSFQ Microprocessors in 1.75-mum Technology (M. Dorojevets).Silicon...Beyond Silicon: Beginning of the End or End of the Beginning? (I. Lagnado & P. de la Houssaye).Taming Tunneling (M. Kelly).Switching Device Based on a First-Order Metal-Insulator Transition Induced by an External Electric Field (F. Chudnovskiy & S. Luryi).DNA Conduction Mechanisms and Engineering (R. Zia, et al.).New Cold Cathode Paradigms for Vacuum Microelectronics Applications (M. Cahay, et al.).PART III: THE FUTURE ALONGSIDE SILICON: OPTICAL.The Evolution of Optical Data Storage (H. van Houten).Long Wavelength Quantum Dot Lasers: From Promising to Unbeatable (N. Ledentsov).Temperature-Insensitive Semiconductor Lasers (L. Asryan & S. Luryi).Trends in Semiconductor Laser Design: Balance Between Leakage, Gain and Loss in InGaAsP/InP Multiquantum Well Structures (G. Belenky, et al.).Terahertz Emitters Based on Intersubband Transitions (Q. Hu, et al.).The Future of Photovoltaics (M. Green).Infrared Detectors Based on InAs/GaSb Superlattices (M. Razeghi, et al.).Solid State Lighting (A. Zukauskas, et al.).Reduction of Reflection Losses in Nonlinear Optical Crystals by Motheye Patterning (A. Zaslavsky, et al.).Growth of III-Nitrides on Si(111) and GaN Templates: Challenges and Prospects (M. Sanchez-Garcia, et al.).PART IV: THE FUTURE WAY BEYOND SILICON: OTHER PARADIGMS.Quantum Computing: A View from the Enemy Camp (M. Dyakonov).Entanglement and Quantum Gate Operations with Spin-Qubits in Quantum Dots (J. Schliemann & D. Loss).Quantum Computation with Quasiparticles of the Fractional Quantum Hall Effect (D. Averin & V. Goldman).Photonics with Chips (A. Nurmikko).Metacrystals: Three Dimensional Systems of Interacting Quantum Dots (D. Johnstone).InGaAs/GaAs Quantum Well Microcavities with Spatially Controlled Carrier Injection (S. Mestanza, et al.).List of Contributors.Index.
Author Biography:
SERGE LURYI is Leading Professor and Chairman of the Department of Electrical and Computer Engineering at State University of New York at Stony Brook. JIMMY XU is Professor of Engineering and Professor of Physics at Brown University in Providence, Rhode Island. ALEX ZASLAVSKY is Associate Professor of Engineering and Physics at Brown University in Providence, Rhode Island.
Autor | Luryi, Serge |
---|---|
Ilmumisaeg | 2002 |
Kirjastus | John Wiley And Sons Ltd |
Köide | Kõvakaaneline |
Bestseller | Ei |
Lehekülgede arv | 408 |
Pikkus | 241 |
Laius | 241 |
Keel | American English |
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